Wafer and Mask Available Wafer chuck for 조각시편, 2“,4”,6” wafer, Mask Holder for 2”,4”,6” wafer Exposure Spec. Exposure Optics : Hg-Lamp 350W, UV400 : 350～450 ㎚ (I-, H-, G-line) Exposure uniformity : ±2% uniformity for 100mm wafer and ±4% for