반도체장비
Chip공정
1. Quality of SiOx, SiNx Deposition - Deposition Rate : ≥ 100 Å/min - Uniformity of Reflective Index of SiO2 : 1.46 ± 0.06 (Five pints : center, top, bottom, left, right) 2. Process Chamber - Chamber material : Anodizing Alumin